A physical method of receiving nanoporous films of the silicon dioxide (SiO2) and
tantalum pentoxide (Ta2O5) in vacuum conditions is brought forward in this work. The
structure and properties of nanoporous films received as a result of self-organization at
magnetron spattering of a compound target are researched in it. Correlations of the quantity
and size of pores, the structure and properties of nanoporous films are determined, as well.
The self-organization process proves to form spatially spattered pores, to change
electrophysical properties of dielectric films and it enlarges their functions.
Keywords: nanoporous oxide films, carbon, self-organization process, magnetron spattering
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